{"id":12668,"date":"2023-11-02T00:06:49","date_gmt":"2023-11-01T16:06:49","guid":{"rendered":"https:\/\/newsletter.sinica.edu.tw/en\/?p=12668"},"modified":"2023-11-02T00:39:02","modified_gmt":"2023-11-01T16:39:02","slug":"euv-lithography","status":"publish","type":"post","link":"https:\/\/newsletter.sinica.edu.tw/en\/12668\/","title":{"rendered":"EUV lithography"},"content":{"rendered":"<p>Time: 14:00-16:00, Tuesday, November 14, 2023<br \/>\nPlace: 1F Auditorium, Institute of Physics, Academia Sinica<br \/>\nSpeaker: Academician Burn-Jeng Lin (College of Semiconductor Research, National Tsing Hua University)<br \/>\nHost: Dr. Chia-Seng Chang (Institute of Physics, Academia Sinica)<br \/>\nWebsite: <a href=\"https:\/\/www.phys.sinica.edu.tw\/lecture_detail.php?id=2788&#038;eng=T\" rel=\"noopener\" target=\"_blank\">https:\/\/www.phys.sinica.edu.tw\/lecture_detail.php?id=2788&#038;eng=T<\/a><br \/>\nAbstract:<br \/>\nEUV lithography is introduced in terms of light source, imaging, mask, resist, its potential, and challenges<\/p>\n<p><img loading=\"lazy\" decoding=\"async\" src=\"https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-724x1024.jpg\" alt=\"EUV lithography\" width=\"724\" height=\"1024\" class=\"aligncenter size-large wp-image-12669\" srcset=\"https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-724x1024.jpg 724w, https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-212x300.jpg 212w, https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-768x1086.jpg 768w, https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-1086x1536.jpg 1086w, https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3-1080x1528.jpg 1080w, https:\/\/newsletter.sinica.edu.tw/en\/wp-content\/uploads\/2023\/10\/2-3.jpg 1240w\" sizes=\"(max-width: 724px) 100vw, 724px\" \/><\/p>\n","protected":false},"excerpt":{"rendered":"<p>Time: 14:00-16:00, Tuesday, November 14, 2023 Place: 1F Auditorium, Institute of Physics, Academia Sinica Speaker: Academician Burn-Jeng Lin (College of Semiconductor Research, National Tsing Hua University) Host: Dr. Chia-Seng Chang (Institute of Physics, Academia Sinica) Website: https:\/\/www.phys.sinica.edu.tw\/lecture_detail.php?id=2788&#038;eng=T Abstract: EUV lithography is introduced in terms of light source, imaging, mask, resist, its potential, and challenges<\/p>\n","protected":false},"author":1,"featured_media":12670,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"_et_pb_use_builder":"","_et_pb_old_content":"","_et_gb_content_width":"","footnotes":""},"categories":[107,5],"tags":[],"acf":[],"_links":{"self":[{"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/posts\/12668"}],"collection":[{"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/comments?post=12668"}],"version-history":[{"count":0,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/posts\/12668\/revisions"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/media\/12670"}],"wp:attachment":[{"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/media?parent=12668"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/categories?post=12668"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/newsletter.sinica.edu.tw/en\/wp-json\/wp\/v2\/tags?post=12668"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}